Versions Compared

Key

  • This line was added.
  • This line was removed.
  • Formatting was changed.

...

Materials and manufacturing technologies

 

  • Does it contain Silicon? Is the structure crystalline or polysilicon?


Strip silicon detectors consist of n type material while having p type aluminium strips (which are used to collect the charge) on the surface which are separated by a thin insulator.The crystalline structure is diamond cubic (FCC). Polysilicon consists of small Si crystals randomly oriented.

 

...

...

 

...

There are two types of material used for package of detector: ceramic or polymer.

 

  • Why some materials are more favorable than others in your sensor or application?

 

 

...

 Typical manufacturing process steps (Figure 13):

1.  Starting Point: single-crystal n-doped wafer. 
2.  Surface passivation by SiO2-layer. E.g. growing by (dry) thermal oxidation at 1030 °C.
3.  Window opening using photolithography technique with etching, e.g. for strips!
4. Doping using either 

...

5.  After ion implantation: Curing of damage via thermal annealing at approx. 600°C, (activation of dopant atoms by incorporation into silicon lattice)
6.  Metallization of front side: sputtering or CVD (chemical vapor deposition)
7.  Removing of excess metal by photolitography: etching of non-covered areas
8.  Full-area metallization of backplane with annealing at approx. 450°C for better adherence between metal and silicon

9. Wafer dicing (cutting)

Image Modified

Image Modified

 

...

 Figure 13. Manufacturing process steps. Reprinted from http://indico.cern.ch/event/124392/contribution/0/material/slides/0.pdf [12].

 

 

 


Silicon radiation detectors characteristics

...