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Materials and manufacturing technologies
- Does it contain Silicon? Is the structure crystalline or polysilicon?
Strip silicon detectors consist of n type material while having p type aluminium strips (which are used to collect the charge) on the surface which are separated by a thin insulator.The crystalline structure is diamond cubic (FCC). Polysilicon consists of small Si crystals randomly oriented.
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There are two types of material used for package of detector: ceramic or polymer.
- Why some materials are more favorable than others in your sensor or application?
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Typical manufacturing process steps (Figure 13):
1. Starting Point: single-crystal n-doped wafer.
2. Surface passivation by SiO2-layer. E.g. growing by (dry) thermal oxidation at 1030 °C.
3. Window opening using photolithography technique with etching, e.g. for strips!
4. Doping using either
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5. After ion implantation: Curing of damage via thermal annealing at approx. 600°C, (activation of dopant atoms by incorporation into silicon lattice)
6. Metallization of front side: sputtering or CVD (chemical vapor deposition)
7. Removing of excess metal by photolitography: etching of non-covered areas
8. Full-area metallization of backplane with annealing at approx. 450°C for better adherence between metal and silicon
9. Wafer dicing (cutting)
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Figure 13. Manufacturing process steps. Reprinted from : http://indico.cern.ch/event/124392/contribution/0/material/slides/0.pdf [12].
Silicon radiation detectors characteristics
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